Dual exposure method of forming a matrix for an electrophotographically manufactured screen assembly of a cathode-ray tube
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 20, 1993
Grant Date -
N/A
app pub date -
Jan 27, 1992
filing date -
Jan 27, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In an electrophotographic process for manufacturing a luminescent screen assembly on an interior surface of a faceplate panel of a CRT, the panel is first coated with a conductive layer and then overcoated with a photoconductive layer. A substantially uniform charge is established on the photoconductive layer. Selected areas of the photoconductive layer are exposed to actinic radiation, through a shadow mask, to affect the charge on the layer. The unexposed areas of the photoconductive layer are developed with triboelectrically-charged, dry-powdered, light-absorptive screen structure material. The photoconductive layer is reexposed to further discharge those open areas free of the light absorptive material while retaining the charge on those areas having light absorptive matrix material thereon. The reexposure increases the voltage contrast between the exposed and the unexposed areas of the photoconductive layer. A second development of the unexposed areas of the photoconductive layer deposits additional light-absorptive screen structure material on the previously deposited material to increase the opacity of the matrix formed thereby.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully