Sheet plasma CVD apparatus
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United States of America Patent
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Jun 8, 1993
Grant Date -
N/A
app pub date -
Dec 23, 1991
filing date -
Dec 25, 1990
priority date (Note) -
Expired
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Abstract
A sheet plasma CVD apparatus for forming a film by generating sheet plasma in parallel with a substrate comprising a gas supply nozzle in opposition to the substrate with the sheet plasma sandwiched therebetween. A source gas supply opening is formed in the center of the gas supply nozzle. A plurality of reaction gas supply openings are formed in the periphery of the source gas supply opening, the source jetted out from the source gas supply opening and the reaction jetted out from the reaction gas supply openings. The source and reaction gases intersect with each other in the sheet plasma.
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