Method of forming a permselective layer
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United States of America Patent
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May 18, 1993
Issued Date -
N/A
app pub date -
Aug 15, 1990
filing date -
Nov 14, 1988
priority date (Note) -
Expired
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Abstract
A method of forming a permselective layer on preselected areas of a substantially planar sensing device is disclosed. The claimed method includes establishing and confining a liquid film, derived from a silane compound mixed in a suitable solvent, within a predetermined area of the sensing device. The process relates to photolithographic imaging and developing methods coupled to a film-curing step that provides a patterned permselective layer having the desired semipermeable characteristics.
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