Metrology system for analyzing panel misregistration in a panel manufacturing process and providing appropriate information for adjusting panel manufacturing processes
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United States of America Patent
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Apr 27, 1993
Grant Date -
N/A
app pub date -
Aug 31, 1990
filing date -
Aug 31, 1990
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A metrology system to analyze panel misregistration in a panel manufacturing process includes a software controlled system which checks defined panel parameters on the four corners of a panel and related artwork for processing with a master pattern etched on a glass reference with a machine vision measuring system. The panel or artwork being checked is positioned by panel center registration means to align the center of the panel with the center of the master pattern. Displacement and rotational differences are entered under software control into a data base and analyzed by a stored program intelligent analyses system into a plurality of parameters based on a parameter model which permits an analysis of the cause of the misregistration.
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