Exposure method and projection exposure apparatus
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United States of America Patent
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Mar 16, 1993
Grant Date -
N/A
app pub date -
Mar 3, 1992
filing date -
Mar 6, 1991
priority date (Note) -
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Abstract
A projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction of one-dimensional movement. The substrate is also moved in a direction of optical axis of projection optical system when moved in the direction of one-dimension, such that a central part of transfer area on the substrate is located on a best focal plane of projection optical system upon scan exposure.
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