Method of producing a substrate having semiconductor-on-insulator structure with gettering sites

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United States of America Patent

PATENT NO 5194395
SERIAL NO

07739540

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Abstract

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A substrate has a semiconductor-on-insulator structure. The substrate has a base substrate, an insulator layer provided on the base substrate, an active substrate provided on the insulator layer and having gettering sites, and an active layer provided on the active substrate and made of a semiconductor. The gettering sites under the active layer eliminate crystal defects and impurities generated in the active layer during the semiconductor device production in which elements are formed in the active layer.

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Patent Owner(s)

Patent OwnerAddress
FUJITSU MICROELECTRONICS LIMITEDKANAGAWA 222-0033

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Wada, Kunihiko Kawasaki, JP 26 362

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