Apparatus and method for multiple ring sputtering from a single target
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 16, 1993
Grant Date -
N/A
app pub date -
Aug 16, 1991
filing date -
Aug 16, 1991
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A source for sputtering from concentric rings on the surface of a single target is shown. The source comprises a rotatable closed-loop magnet having a plurality of curved sections of different average radius interconnected by a equal number of radial sections. In the preferred embodiment the curved sections each have a shape which results in a predetermined erosion profile in the associated concentric ring of the sputter target. The relative rate of sputtering from each of the rings may be controlled by adjusting the relative lengths of the curved portions of the closed-loop magnet.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully