Mass spectrometer for analyzing ultra trace element using plasma ion source

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United States of America Patent

PATENT NO 5185523
SERIAL NO

07848932

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Abstract

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A mass spectrometer for analyzing ultra trace element using plasma ion source comprising, a plasma generating means for ionizing sampling gas by generating plasma, a vaccum chamber for taking in ions of the sampling gas from a hole of the vacuum chamber, an ion lens and a mass analyzing portion, and an ion detector for detecting the ions which are passed through the ion lens and the mass analyzing portion, wherein further comprising, a moving mechanism for moving said plasma generating means according to a vacuum degree measured in the vacuum chamber so as to make the sensitivity of the mass spectrometer higher.

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Patent Owner(s)

Patent OwnerAddress
HITACHI LTD6-6 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 1008280 ?1008280
HITACHI INSTRUMENT ENGINEERING CO LTD832-2 NAGAKUBO HORIGUCHI KATSUTA-SHI IBARAKI-KEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kitagawa, Masatoshi Mito, JP 52 633
Okamoto, Yukio Sagamihara, JP 54 779
Ono, Takayuki Katsuta, JP 101 787
Shinden, Tetuya Katsuta, JP 2 15

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