Microwave plasma CVD apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 12, 1993
Grant Date -
N/A
app pub date -
Mar 19, 1991
filing date -
Mar 30, 1990
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A microwave CVD apparatus comprises a rectangular applicator with microwave inlets, a bell jar with an inlet and an outlet for reaction gas arranged in the applicator, and a sample-receiving table. Reaction gas is introduced into the bell jar and plasma of the reaction gas is generated therein. At least one of walls of the applicator is movable so as to change distribution of plasma intensity continuously, so that material is uniformly deposited on the whole surface of the sample.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully