Method and apparatus for the inspection of patterns
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 22, 1992
Grant Date -
N/A
app pub date -
Dec 19, 1990
filing date -
Dec 20, 1989
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The present invention relates to a technique, in the inspection of a defect of a semiconductor memory or the like, in which chip comparison is separated from repetitive pattern comparison in a region of a wafer to be inspected whereby both the comparisons are rendered possible to perform in parallel in one and the same scanning.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully