Plasma CVD process for coating a basic metallic body with a non-conductive coating material
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United States of America Patent
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Dec 22, 1992
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May 31, 1991
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Dec 10, 1988
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Abstract
A process for coating a basic metallic substrate with a non-metallic coating layer with a plasma-activated CVD deposition generated by applying a pulsed DC voltage between the substrate and another electrode and by maintaining a potential of residual DC voltage between pulses of the applied voltage.
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