Process for decreasing the level of impurities in zirconium chloride, titanium chloride and hafnium chloride
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United States of America Patent
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Dec 15, 1992
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N/A
app pub date -
May 22, 1991
filing date -
May 22, 1991
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Abstract
An improved halogenator process and system is provided which significantly and economically decreases the level of impurities in the processing of various refractory metals and their halides and particularly hafnium tetrachloride which is condensed from gases produced by the chlorination of Zircon.
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