Reaction chamber with controlled radiant energy heating and distributed reactant flow

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United States of America Patent

PATENT NO 5156820
SERIAL NO

07351829

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A reaction chamber for a controlled reaction on a reaction surface of a sample provides for controlled distribution of radiant energy over the reaction surface to offset radiant heat loss of the sample, and establishes uniform distribution of reactant flow on the sample. A lamp housing supplies radiant energy over the sample, which absorbs at least a component of the radiant energy. A support member which supports the sample within the reaction chamber is formed of a material which is essentially transparent to the radiant energy so that it does not behave as a susceptor. An array of lamps, is mounted with the reaction chamber so that direct radiant energy is transmitted through a window to the reaction surface of the sample. A reflecting surface on the housing includes a lamp seat for each lamp in the array with an individually specified position, curvature and tilt with respect to the reaction surface. A source of reactant gas is coupled through a gas port to the reaction chamber between the window and the reaction surface. A reactant distribution plate is mounted between the gas port and the reaction surface, and causes distributed flow of reactant gas over the reaction surface. The distribution plate includes a plurality of perforations having a pattern which determines the distribution of reactant gas flow.

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Patent Owner(s)

Patent OwnerAddress
STEAG CVD SYSTEMS LTDRAMAT GABRIEL INDUSTRIAL PARK P O BOX 171 RAFI KORIAT MIGDAL HA'EMEK 10551

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ku, Yen-Hui Sunnyvale, CA 5 226
Wong, Fred Fremont, CA 3 187

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