Preparation of photosensitive material to withstand a lamination process
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United States of America Patent
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Aug 11, 1992
Issued Date -
N/A
app pub date -
Jun 26, 1989
filing date -
Jun 12, 1987
priority date (Note) -
Expired
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Abstract
A method for processing exposed holograms to enhance their thermal stability and enable them to withstand a windshield lamination process is disclosed. The secondary processing procedure entails an optional step of applying a moisture barrier to the hologram, followed by heat stabilizing the hologram and storing it in a relatively low humidity environment. Specifically, the exposed holographic material is heated to a peak temperature of about 135.degree. C. and thereafter cooled to provide a thermally stabilized holographic material that maintains its holographic qualities over a relatively broad range of temperatures.
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