Method of image enhancement for the coherence probe microscope with applications to integrated circuit metrology
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 12, 1992
Grant Date -
N/A
app pub date -
Mar 2, 1990
filing date -
Mar 2, 1990
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method whereby the image produced in a coherence probe microscope is modified by means of a certain specific additive electronic transformation for the purpose of improving the measurement of selected features. The technique improves measurement accuracy on optically complex materials, in particular it improves the accuracy of linewidth measurement on semiconductor linewidths.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully