Process for treating semiconductors
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United States of America Patent
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Mar 3, 1992
Grant Date -
N/A
app pub date -
Jul 13, 1990
filing date -
Jul 19, 1989
priority date (Note) -
Expired
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Abstract
Semiconductors are treated with such surface-treating solutions as ultra-pure water, dilute hydrofluoric acid and an organic solvent and then subjected to removal of the surface-treating solutions remaining on the surface of the semiconductor in an inert gas atmosphere of high purity while contacting the surface of the surface-treated semiconductor only with the inert gas of high purity, whereby contamination with impurities on atom level from the atmosphere can be prevented.
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