Mask making process
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United States of America Patent
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Feb 18, 1992
Grant Date -
N/A
app pub date -
Aug 17, 1990
filing date -
Aug 17, 1990
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for making lithographic masks using a soda lime glass substrate that is useful particularly in the manufacture of near submicron and submicron integrated circuits. The problem of 'mouse nipping' at the edges of the chromium metal and chromium oxide mask lines is overcome by using a very thin high molecular weight coating under the standard resist layer and over the chromium oxide layer.
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