Secondary ion mass analyzing apparatus

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United States of America Patent

PATENT NO 5086227
SERIAL NO

07599407

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A secondary ion mass analyzing apparatus is suitable for a depth directional analysis of a specimen. The apparatus includes means for forming an image of said secondary ions, an aperture disposed on a position in which the secondary ion image is formed, means for detecting the secondary ions which have passed through the aperture and for converting the detected ions into electrical signals, and means for displaying an image of said aperture based on the electrical signals. In such a manner, the aperture is disposed on the secondary ion image forming position. The image of the aperture is displayed on the image displaying apparatus by using the secondary ions which have passed through the aperture. If the ion image is not formed on the position of the aperture, the contour of the aperture image would be unclear while if the ion image is formed on the position of the aperture, the contour of the aperture image would be clear. Accordingly, by monitoring the clearness of the aperture image, focusing of the ion image upon the aperture position may be determined. Therefore, the secondary ions which have generated from the specimen corresponding to a portion other than the central portion of the primary ion beam can be prevented from being introduced to a mass analyzing portion. A depth directional analysis of the specimen can be accomplished at a high accuracy.

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Patent Owner(s)

Patent OwnerAddress
HITACHI LTD A CORP OF JAPAN6 KANDA SURUGADAI 4-CHOME CHIYODA-KU TOKYO
HITACHI INSTRUMENT ENGINEERING CO LTD A CORP OF JAPAN882 ICHIGE KATSUTA-SHI IBARAKI-KEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirose, Hiroshi Katsuta, JP 26 355
Tamura, Hifumi Hachioji, JP 28 333
Toita, Hiroshi Katsuta, JP 2 25

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