Deposition process in the vapour phase at low temperature of a ceramic coating of the metallic nitride or carbonitride type
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United States of America Patent
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Dec 31, 1991
Grant Date -
N/A
app pub date -
Feb 14, 1990
filing date -
Feb 16, 1989
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Expired
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Abstract
The object of the invention is a one-step deposition process of a coating of the ceramic type based on nitrides or carbonitrides of at least one metallic element selected from Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf and Ta on a metallic or ceramic substrate, massive or obtained from fibres, by deposition in the vapor phase wherein a coating is deposited on the substrate by a chemical means at a pressure lower than 10 kPa at a temperature lower than 600.degree. C. and by using a system of precursors constituted simultaneously of: an organo-metallic precursor of the said metallic element selected from the organo-metallic compounds of the sandwich type of general formula: [Ar.sup.1 M Ar.sup.2.sub.n ]L.sub.x L'.sub.y a nitrogen precursor selected from ammonia and hydrazine.
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