Exposure apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 24, 1991
Grant Date -
N/A
app pub date -
Nov 21, 1990
filing date -
Feb 21, 1990
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
With an exposure apparatus according to the present invention, it is possible to project an image of a mask in a any large number onto a band-shaped film sequentially in a longitudinal direction with high precisions in position, magnification and focus. Thus, the apparatus can be provided for fabrication of an FPC film of a high circuit density.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully