Positive and negative working radiation sensitive mixtures and production of relief patterns
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 3, 1991
Grant Date -
N/A
app pub date -
May 16, 1989
filing date -
May 19, 1988
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully