Method of producing p-type amorphous silicon carbide and solar cell including same

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United States of America Patent

PATENT NO 5061322
SERIAL NO

07408258

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A method of producing a p-type hydrogenated amorphous silicon carbide thin film comprising the steps of preparing a raw material gas mixture consisting of a silicon compound, a hydrocarbon or a fluocarbon, and a boron compound, diluting the raw material gas mixture with hydrogen gas, and decomposing the raw material gas mixture by glow discharge to achieve a resultant film having a prescribed value of photoconductivity with a reduced optical absorption coefficient.

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Patent OwnerAddress
NEW ENERGY AND INDUSTRIAL TECHNOLOGY DEVELOPMENT ORGANIZATION1-1 HIGASHIIKEBUKURO 3-CHOME TOSHIMA-KU TOKYO

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Inventor Name Address # of filed Patents Total Citations
Asano, Akihiko Kanagawa, JP 28 669

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