Method for preparing a marking structure
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United States of America Patent
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Sep 17, 1991
Issued Date -
N/A
app pub date -
May 2, 1990
filing date -
Sep 11, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An improved microporous marking structure has a layer of a microporous material containing a marking fluid and an absorbent backing layer superposed thereon which shortens processing time by absorbing excess marking fluid from the microporous layer. The marking structure according to the invention may be advantageously used to make a self-inking hand stamp. No lengthy step for removing excess ink from the microporous layer is needed.
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