Method of thin film deposition using laser ablation

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United States of America Patent

PATENT NO 5049405
SERIAL NO

07547531

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Abstract

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A rotating cylindrical target surface is provided for the laser ablation process of depositing thin films on a substrate. The target is mounted in a vacuum chamber so that it may be rotated about the longitudinal axis of the cylindrical surface target and simultaneously translated along the longitudinal axis. A laser beam is focused by a cylindrical lens onto the target surface along a line that is at an angle with respect to the longitudinal axis to spread the plume of ablated material over a greater radial arc. The plume may be spread in the longitudinal direction by providing a concave or convex lateral target surface. The angle of incidence of the focused laser beam may be other than normal to the target surface to provide a more glancing geometry. Simultaneous roation about and translation along the longitudinal axis produce a smooth and even ablation of the entire cylindrical target surface and a steady evaporation plume. Maintaining a smooth target surface is useful in reducing undesirable splashing of particulates during the laser ablation process and thereby depositing high quality thin films.

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Patent Owner(s)

Patent OwnerAddress
ROCKWELL SCIENTIFIC LICENSING LLCP O BOX 1085 MAIL CODE A5 THOUSAND OAKS CA 91358

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cheung, Jeffrey T Thousand Oaks, CA 23 738

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