Importance

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Abstract

A DRAM has a memory cell array in which a plurality of word lines (WL) and a plurality of bit lines (B0) are arranged to orthogonally intersect each other. Memory cells (MC) are arranged in a direction intersecting the bit lines. Capacitors (10) of the memory cells are arranged between the adjacent bit lines. On a silicon substrate (20), the bit line is formed substantially at the same height with the word line and positioned lower than the top of the capacitor. An opening region (15) is formed so that electrode layers (11, 13) of the capacitor do not cover the bit line. The arrangement of the capacitors between the adjacent bit lines allows reduction in the inter-bit-line capacitance. In addition, formation of the region above the bit line which is not covered by the electrode layers of the capacitor makes it possible to reduce the stray capacitance between the capacitor and the bit line. As a result, reduction in amount of the read-out signals which might be caused by an increased bit-line capacitance can be prevented.

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First Claim