Film circuit substrate exposure apparatus

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United States of America Patent

PATENT NO 5021821
SERIAL NO

07469113

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Abstract

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A film circuit substrate exposure apparatus is disclosed, in which members movable along an optical axis such as a reticle support, a projection lens and a film pressing member are mounted on a common linear movement guide by using a linear movement driver, for instance a cross roller guide, in a predetermined spaced-apart relation to one another to set the optical axis and without inclination with respect to the optical axis. The apparatus thus pronounced practical merits such as freedom from rattling, capability of ready positioning and focusing operations, less partial out of focus or aberration of obtainable patterns, and particularly elimination of complicated operations in double side exposure.

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Patent Owner(s)

Patent OwnerAddress
ASAHI TOKAIBUILDING 19TH FLOOR 6-1 2-CHOME OTE-MACHI CHIYODA-KU TOKYO 100

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Suzuki, Shigeru Tachikawa, JP 294 3098

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