Process for the production of an inverted structure, active matrix display screen
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United States of America Patent
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May 14, 1991
Grant Date -
N/A
app pub date -
Aug 24, 1990
filing date -
Aug 29, 1989
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Process for producing a wall for an active matrix display screen. By a first etching is formed stack rows of layers (L) with a metal at the ttom. The gaps between the rows are filled by a negative polyimide. On the surface are etched columns (C) and blocks (P). These elements serve as a mask for an etching leaving control transistors in a gate configuration below the same. Application to the production of liquid crystal display screens.
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