Chemically-assisted ion beam milling system for the preparation of transmission electron microscope specimens
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United States of America Patent
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Apr 23, 1991
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app pub date -
Nov 6, 1989
filing date -
Nov 6, 1989
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Abstract
An ion beam milling system for the preparation of transmission electron microscope specimens suitable for atomic resolution imaging, particularly of III-V and II-VI compound semiconductors and their alloys, is described. The system includes ion beam sources and reactive molecular gas jets which may be operated in combination or separately, as appropriate. A new heated specimen holder, giving greatly increased reaction rates with the molecular gas jet, allows milling angles very close to zero.
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