Apparatus having reduced mechanical forces for supporting high magnetic fields
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United States of America Patent
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Feb 12, 1991
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N/A
app pub date -
Feb 17, 1989
filing date -
Feb 17, 1989
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Expired
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Abstract
The present invention identifies several configurations of conducting elements capable of supporting extremely high magnetic fields suitable for plasma confinement, wherein forces experienced by the conducting elements are significantly reduced over those which are present as a result of the generation of such high fields by conventional techniques. It is anticipated that the use of superconducting materials will both permit the attainment of such high fields and further permit such fields to be generated with vastly improved efficiency.
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