Process for forming a crystalline diamond film

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United States of America Patent

PATENT NO 4987002
SERIAL NO

07347027

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Abstract

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A crystalline diamond film is formed on a thin substrate. Energy is applied by a thermal plasma torch to a gas mixture to deposit carbon particles onto the substrate. The substrate is positioned on a pedestal with a cooling facility in which an intermediate layer of thermally conductive powder is interposed between the substrate and the pedestal.

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Patent Owner(s)

Patent OwnerAddress
KABUSHIKI KAISHA KENWOOD A CORP OF JAPAN17-5 SHIBUYA 2-CHOME SHIBUYA-KU TOKYO
NAMIKI PRECISION JEWEL CO LTD A CORP OF JAPAN8-22 SHINDEN 3-CHOME ADACHI-KU TOKYO 123

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kotaki, Toshiroh Tokyo, JP 1 49
Sakamoto, Masakatu Hachiohji, JP 2 70
Toshima, Hiroaki Ibaragi, JP 23 737
Yaguchi, Youichi Tokyo, JP 1 49

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