Reticle frame assembly
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United States of America Patent
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-
Jan 22, 1991
Grant Date -
N/A
app pub date -
Mar 25, 1987
filing date -
Mar 25, 1987
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A reticle frame for precisely holding a reticle or mask used in photolithography with a minimum of distortion. A plurality of adjusting screws are used to accurately position the reticle within the frame. Transversely compliant axial loading springs opposing the adjusting screws reduce the bending forces acting on the reticle. Precision balls are used to establish a plane for the reticle further reducing bending forces thereon causing less distortion and thereby proving greater resolution when the reticle image is reproduced on a semiconductor wafer.
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