Negative photoresists of the polyimide type containing 1,2-disulfones
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United States of America Patent
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Dec 25, 1990
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N/A
app pub date -
Mar 9, 1989
filing date -
Mar 17, 1988
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Expired
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Abstract
The invention relates to negative photoresists of the polyimide type essentially containing, in an organic solvent, in each case at least (a) one polyamide-acid or polyamide-acid derivative prepolymer which can be converted into a highly heat-resistant polyimide polymer, (b) a photoinitiator, and, if appropriate, further customary additives which contain, as the photoinitiator, a compound of the formula I R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 I in which R.sup.1 and R.sup.2 are as defined.
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