Organogermanium compounds and process for producing the same

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United States of America Patent

PATENT NO 4977287
SERIAL NO

07400062

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Abstract

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The present invention provides (A) an organogermanium compound represented by the general formula (1) ##STR1## wherein X is a halogen atom and R is a hydrogen atom, a lower alkyl group or a phenyl group, or by the general formula (2) ##STR2## wherein X and Y are each a halogen atom and R is a hydrogen atom, a lower alkyl group or a phenyl group, or by the general formula (3-O), ##STR3## wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, or by the general formula (3-S), ##STR4## wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, or by the general formula (4-O), ##STR5## wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, or by the general formula (4-S), ##STR6## wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, and (B) a process for producing an organogermanium compound represented by each of the formulas (3-O), (3-S), (4-O) and (4-S).

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Patent Owner(s)

Patent OwnerAddress
ASAI GERMANIUM RESEARCH INSTITUTE CO LTDKAWASAKI-SHI KANAGAWA 215-0004

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kakimoto, Norihiro Machida, JP 22 52
Nakamura, Kunie Sagamihara, JP 7 15
Yoshihara, Toru Tama, JP 53 594

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