Draft chamber
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United States of America Patent
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Dec 11, 1990
Issued Date -
N/A
app pub date -
Oct 25, 1989
filing date -
Apr 3, 1987
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A draft chamber is located within a clean room for sequentially immersing and processing carriers such as silicone wafers in a plurality of solution vessels provided in the draft chamber. In the draft chamber, a first air flow moves in a substantially horizontal direction from the front portion of the draft chamber toward the rear portion above the surfaces of solutions contained in chemical solution vessels which generate toxic gasses and a second air flow moves downward from the ceiling of the draft chamber. Thus, the toxic gasses generated from the chemical solution vessels are prevented from leaking into the clean room.
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