Plasma processing apparatus with a lisitano coil
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United States of America Patent
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Nov 27, 1990
Grant Date -
N/A
app pub date -
Apr 29, 1988
filing date -
May 1, 1987
priority date (Note) -
Expired
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Abstract
A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. The microwave generator consists of a lisitano coil which is capable of emitting a microwave in the TE.sub.011 mode. In the light of such a microwave, a high quality film can be deposited.
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