Laser microbeam machine for acting on thin film objects, in particular for chemically etching or depositing substance in the presence of a reactive gas
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 23, 1990
Grant Date -
N/A
app pub date -
Nov 24, 1989
filing date -
Nov 25, 1988
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The machine of the invention comprises a sealed enclosure (10) in which a microscope objective lens (34) is fixed and receives a laser beam (36) via a thick transparent window (38), the enclosure also containing a reaction chamber (20) constituted by a sealed box having a lid which constitutes a thin transparent window (56) beneath which the thin film object (32) to be treated is placed. Means (72, 80, 74) serve to evacuate the enclosure (10) and the reaction chamber (20) and to convey reactive gas into the reaction chamber. The invention is particularly applicable to treating electronic circuits, hybrid circuits, etc.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully