Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents
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United States of America Patent
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Sep 25, 1990
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N/A
app pub date -
Oct 28, 1988
filing date -
Oct 28, 1988
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Abstract
2-diazo-1-ones are useful deep UV photoresist solubility modification agents exhibiting improved photosensitivity allowing shorter deep UV exposure times to achieve the same extent of photoreaction as with prior art solubility modification agents. The 2-diazo-1-one solubility modification agents when used as photoactive solubility modification components in photoresist compositions permit the photoresist compositions to act as either positive or negative photoresist compositions depending upon the developer employed, namely, as a positive resist when a metal ion containing developer is employed and as a negative resist when a metal ion free developer is employed.
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