Microlithographic apparatus
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United States of America Patent
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Aug 28, 1990
Grant Date -
N/A
app pub date -
May 18, 1988
filing date -
May 18, 1988
priority date (Note) -
Expired
status (Latency Note)
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Abstract
This invention is directed to electro-magnetic alignment apparatus which includes a monolithic stage, a sub-stage, an isolated reference structure, force actuators interposed between the monolithic stage and the sub-stage for suspending and positioning the monolithic stage in space, sensors for sensing the position of the monolithic stage and outputting a signal to control circuitry, which compares the sensed position with a commanded stage position and outputs an error signal to the force actuator, and actuators for controlling the position of the sub-stage to follow the approximate position of the monolithic stage.
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