Method and apparatus for cleansing gases
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United States of America Patent
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Jul 17, 1990
Grant Date -
N/A
app pub date -
Mar 31, 1989
filing date -
Sep 17, 1986
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A gas cleansing arrangement comprising a vessel (1) partially filled with liquid (32) and a gas distribution means (14) beneath the liquid surface (34). The gas distribution means (14) comprises obliquely and downwardly extending distribution pipes (26) with upwardly facing inlet openings (64) for contaminated gas and a lower opening (22). The inlet openings are each connected to a venturi device (28) having an outlet opening (31) and suction openings (29) facing the liquid (32). In use, pressurized gas urges an inner liquid surface (46) downwards in the distributor means (14), until the liquid surface (46) reaches and exposes the uppermost inlet opening or openings (64). The gas is then forced through respective venturi device (28) at a pressure drop corresponding to the height difference (h) between the inner liquid surface (46) and respective outlet opening (31). Full working pressure is always obtained and the number of operating venturi devices is automatically adapted to the incoming gas flow by rising and lowering the inner liquid surface (46).
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