Germanosilicate spin-on glasses
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United States of America Patent
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Jun 19, 1990
Issued Date -
N/A
app pub date -
Jun 21, 1985
filing date -
Jun 21, 1985
priority date (Note) -
Expired
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Abstract
A process is disclosed for forming a planarized or smooth surface binary glass insulating film comprised of germanium dioxide and silicon dioxide by a spin-on process. The resulting structure has a film thickness uniformity which varies less than 5% over the surface of the wafer. The structure is formed by mixing a predetermined solution of TEOS and TEOG in a lower alcohol or ketone solvent and catalyzing by the addition of sufficient acid to raise the pH to 1.5 to 2.0 to favor gel formation. The resultant solution is then spun on at an RPM selected to give the desired film thickness for a given solids content of the solution.
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