Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist
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United States of America Patent
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Jun 5, 1990
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N/A
app pub date -
Nov 18, 1988
filing date -
Jul 18, 1985
priority date (Note) -
Expired
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Abstract
A high contrast developing process is described for use after pre-exposure to UV-visible radiation to produce increased sensitivity during lithographic processing of positive resist layers. Compared to samples which have not been subjected to the methods of this invention, sensitivity increases of a factor of 2-4 are to be expected. An additional benefit of low film loss from unexposed resist is obtained. The system disclosed is applicable to lithographic exposures utilizing electrons, photon (e.g. UV-visible, x-rays, etc.) and atomic or molecular charged particles. Specifically, as a result of the increased sensitivity, higher throughput during lithographic processing for the fabrication of photomasks and semiconductor devices is realized.
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