High-performance electrodeposited chromium layers formed at high current efficiencies
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United States of America Patent
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May 22, 1990
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N/A
app pub date -
Sep 14, 1989
filing date -
Sep 14, 1989
priority date (Note) -
Expired
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Abstract
Novel chromium plating baths suitable for electrodepositing chromium layers which are bright, adherent, smooth and hard, and are capable of being formed at both high and low current densities, and at high cathodic current efficiencies, consist essentially of chromic acid and sulfoacetic acid in a concentration range of about 40 to 150 g/l., and selenate or tellurate ion. Sulfate ion, if present, is included in low concentrations such that the Cr/SO.sub.4 ratio is high, preferably 300:1 or more.
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