Remote ion source plasma electron gun

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 4910435
SERIAL NO

07222127

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A wide area electron gun in which an electron beam originates from secondary emission electrons emitted by a target bombarded by ions. A cylindrical main housing has a central region where the secondary emission target is located and auxiliary housings on opposed sides of the target, outside of the main housing, contain low temperature ion plasmas. Ion beams are extracted from peripheral regions of the plasmas and enter narrow ports or slits connecting the auxiliary housings with the main housing. A higher pressure in the auxiliary housings, compared to the main housing, supports ion flow into the main housing. The ion beams have a low angle of incidence to the plane of the target and may be either slightly below or above the target. In the case the beam enters from above the target, the target is segmented, like venetian blinds. The secondary electrons exit the main housing through a foil window such that the electron beam is almost at right angles to the ion beams.

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Patent Owner(s)

Patent OwnerAddress
USHIO INCORPORATED6-1 OHTEMACHI 2-CHOME CHIYODA-KU TOKYO 100-0004

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Wakalopulos, George Danville, CA 24 816

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