Wide area soft vacuum abnormal glow electron beam discharge hardening process
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United States of America Patent
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Feb 27, 1990
Grant Date -
N/A
app pub date -
Nov 17, 1988
filing date -
Nov 17, 1988
priority date (Note) -
Expired
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Abstract
A process for large area hardening of photoresists or polymer films placed on substrates is disclosed. The process requires the use of a short duration (<1 us.) pulsed electron beam produced in soft vacuum by an abnormal glow discharge. The pulsed electron beam interacts with the patterned photoresist/polymer resist so as to harden or stabilize the patterns thereon by electron induced cross-linking. The use of a soft vacuum environment allows for both thermal as well as chemically induced hardening.
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