Radiation-resistant high molecular composition
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 13, 1990
Grant Date -
N/A
app pub date -
Sep 21, 1987
filing date -
Sep 22, 1986
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A radiation-resistant high molecular composition is disclosed, characterized in that, to the high molecular polymer, a halogenated acenaphtylene and/or condensates thereof represented by a following general formula [I] ##STR1## (wherein, X indicates a chlorine or bromine atom, a indicates 0 to 2, b indicates 1 to 6 and n indicates an integer not less than 1) and a diphenyl ether derivative represented by a following general formula [II] ##STR2## (wherein, R.sub.1 and R.sub.2 indicate any ones of hydrogen atom, alkyl, alkoxy, phenyl phenoxy, diphenyloxy and terphenyloxy group) and/or basic lead compound are formulated.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully