Continuous process for refining silicon
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United States of America Patent
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Feb 13, 1990
Grant Date -
N/A
app pub date -
Aug 9, 1988
filing date -
Aug 19, 1987
priority date (Note) -
Expired
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Abstract
An improved process for purifying and refining silicon containing impurities comprises: (i) continuously melting impure silicon to form a thin film silicon melt, preferably on an inclined surface of a silicon-resistant material, (ii) continuously treating the thin film silicon melt with a reactive gas with or without an inert gas, (iii) optionally degassing the treated silicon melt, and thereafter (iv) continuously crystallizing the treated silicon.
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