Sheet plasma sputtering method and an apparatus for carrying out the method
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United States of America Patent
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Dec 5, 1989
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N/A
app pub date -
Sep 9, 1988
filing date -
Sep 8, 1988
priority date (Note) -
Expired
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Abstract
A high-efficient sheet plasma sputtering method and an apparatus for carrying out the method which comprise means for deforming an arc plasma stream into a form of sheet by a magnetic field so that ions in the sheet plasma are accelerated to a target which is controlled to have a negative potential to the sheet plasma, whereby a coating layer is formed by sputtering on a substrate arranged opposite the target with respect to the sheet plasma.
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