Apparatus for photoresist stripping
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United States of America Patent
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Dec 5, 1989
Issued Date -
N/A
app pub date -
Jan 11, 1988
filing date -
Aug 11, 1986
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Expired
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Abstract
An apparatus for rapidly stripping a photoresist which utilizes an oxidizing fluid such as ozone. A very thin layer of oxidizing fluid of four millimeters or less is flowed over the photoresist. The fluid flows at high velocity over the resist, while the resist is heated. Additionally, the resist may be irradiated with ultraviolet radiation at an irradiance of at least about 800 milliwatts/cm.sup.2.
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