Ion beam profile scanner having symmetric detector surface to minimize capacitance noise
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United States of America Patent
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Oct 31, 1989
Issued Date -
N/A
app pub date -
Sep 1, 1988
filing date -
Jun 7, 1988
priority date (Note) -
Expired
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Abstract
A beam profile scanner includes a probe constructed of a material that will emit electrons when struck by a particle beam such as an ion beam. The probe is passed through the ion beam and the electrons emitted by the probe are detected when they strike a detector surface that is configured and oriented to offer a substantially symmetric view to the moving probe in order to minimize changing capacitance noise. The detector surface is electrically connected to an analyzer circuit that monitors and further processes the current caused by electrons striking the dectector surface and that generates a signal corresponding to the ion beam profile. In the preferred embodiment, the detector surface is a circular metal plate charged to attract electrons emitted by the probe, and the symmetric view of the surface with respect to the probe helps to maintain noise at an acceptably low level. Also, preferably, a preamplifier is connected to and mounted proximate to the detector surface in a vacuum within a detector housing, and both the detector surface, amplifier and probe are disposed inside a grounded shield structure.
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