Postive working multi-level photoresist
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United States of America Patent
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Sep 5, 1989
Grant Date -
N/A
app pub date -
Oct 20, 1986
filing date -
Oct 20, 1986
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A process for forming a multi-level positive working photosensitive element. One forms a composition containing an alkali soluble resin, an o-quinonediazide compound and an in-situ generated acid catalyzed crosslinker in a solvent mixture. After coating on a substrate, drying and partially cross-linking the first layer, a second positive working light sensitive layer is applied. Each light sensitive layer is activated by u.v. radiation in different parts of the spectrum. The top layer is imagewise exposed and developed to form a mask. The second layer is flood exposed through this mask and developed. Each development is conducted with an aqueous alkaline solution.
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